School personnel information

写真b

HAMAGUCHI Satoshi


Keyword

plasma physics

Mail Address

Mail Address

URL

http://www.camt.eng.osaka-u.ac.jp/hamaguchi/

Organization 【 display / non-display

  • 2004.04.01 - 2013.03.31, Science and Technology Center for Atoms,Molecules and Ions Control, Graduate School of Engineering, Professor

  • 2013.04.01 - 2013.04.15, Center for Atomic and Molecular Technologies, Graduate School of Engineering, Professor

  • 2013.04.16 - , Center for Atomic and Molecular Technologies, Graduate School of Engineering, Professor

Education 【 display / non-display

The University of Tokyo Faculty of Science  Graduated B. Sc. in Physics 1982.03
The University of Tokyo Graduate School, Division of Science  Completed M. Sc. in Physics 1984.03
New York University Department of Mathematics, Graduate School of Arts and Science  Completed M. Sc. in Mathematics 1986.09
The University of Tokyo Graduate School, Division of Science  Completed Ph. D. in Physics 1987.03
New York University Department of Mathematics, Graduate School of Arts and Science  Completed Ph. D. in Mathematics 1988.06

Employment Record 【 display / non-display

Consultant, Courant Institute of Mathematical Sciences, New York Univeristy 1988.06 - 1988.08
Research Fellow, Institute for Fusion Studies, Univeristy of Texas at Austin 1988.09 - 1990.05
Research Staff Member, IBM T. J. Watson Research Center 1990.06 - 1998.03
Associate Professor, Kyoto University 1998.04 - 2004.03
Professor, Osaka Univeristy 2004.04 -

Research topics 【 display / non-display

  • nuclear fusion
    Nuclear engineering-related

  • Plasma Physics
    Fundamental plasma-related

  • Plasma Science and Technologies
    Semiconductors, optical properties of condensed matter and atomic physics-related

  • plasma processes/plasma processing/etching/CVD/semiconductor processing/ion implantation

Academic Society Membership 【 display / non-display

  • American Vacuum Society

  • Japan Society of Applied Physics

  • American Physical Society

  • Japan Society of Plasma Science and Nuclear Fusion Research

  • Physical Society of Japan

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Academic Papers 【 display / non-display

  • Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes, Li Hu, Ito Tomoko, Karahashi Kazuhiro, Kagaya Munehito, Moriya Tsuyoshi, Matsukuma Masaaki, Hamaguchi Satoshi, JAPANESE JOURNAL OF APPLIED PHYSICS,59, 2020.06, https://iopscience.iop.org/article/10.35848/1347-4065/ab8681/pdf, Papers

  • Stability of hexafluoroacetylacetone molecules on metallic and oxidized nickel surfaces in atomic-layer-etching processes, Basher Abdulrahman H., Krstic Marjan, Takeuchi Takae, Isobe Michiro, Ito Tomoko, Kiuchi Masato, Karahashi Kazuhiro, Wenzel Wolfgang, Hamaguchi Satoshi, JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,38(2), 2020.03, Papers

  • Molecular dynamics simulation of Si and SiO2 reactive ion etching by fluorine-rich ion species, Tinacba Erin Joy Capdos, Isobe Michiro, Karahashi Kazuhiro, Hamaguchi Satoshi, SURFACE & COATINGS TECHNOLOGY,380, 2019.12, Papers

  • Prediction of Plasma Etching Yields by Machine Learning,95(11) 542-547, 2019.11, Other(In Japanese)

  • Inter- and Intraspecific Variation in Sex Hormone-Induced Sex-Reversal in Medaka, Oryzias latipes and Oryzias sakaizumii, Myosho Taijun, Sato Tadashi, Nishiyama Hiroka, Watanabe Akiho, Yamamoto Jun, Okamura Tetsuro, Onishi Yuta, Fujimaki Rei, Hamaguchi Satoshi, Sakaizumi Mitsuru, Kobayashi Tohru, ZOOLOGICAL SCIENCE,36(5) 425-431, 2019.10, Papers

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Books 【 display / non-display

  • Special, Plasma ion processes and their applications: modeling, Satoshi Hamaguchi, Ohm Co., 2005.08

  • Special, Modeling of reactive ion etching for Si/SiO2 systems, S. Hamaguchi and H. Ohta, Springer-Verlag, Wien, 2001.12

  • Special, Dynamical properties of strongly coupled dusty plasmas, S. Hamaguchi and H. Ohta, Elsevier Sci., 2000.12

  • Special, "Dusty Plasmas and Coulomb Crystals,"in High Field Science, S. Hamaguchi, Plenum Publisher, New York, 2000.10

  • Special, "Mathematical methods for thin film deposition simulations," in Modeling of Film Deposition for Microelectronic Applications,, S. Hamaguchi, Academic Press, San Diego, 1996.04

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Patents / Utility models / Designs 【 display / non-display

  • United States, The apparatus and method for the generation of glow plasmas, Katsuhisa Kitano, Hironori Aoki, Satoshi Hamaguchi, PCT/JP2006/317652(Registration), 2006.09

  • Japan, The apparatus and method for the generation of glow plasmas, Katsuhisa Kitano, Hironori Aoki, Satoshi Hamaguchi, 特願2006-058721(Registration), 2006.03

  • United States, High density plasma processing tool with toroidal magnetic field, Manoj Dalvie and Satoshi Hamaguchi, US05505780(Registration), 1994.10, 1996.10