School personnel information

写真b

OSHIMA Akihiro


Keyword

Nanoscience, Nanofabrication, Polymer chemistry

Organization 【 display / non-display

  • 2003.04.01 - 2003.05.31, The Institute of Scientific and Industrial Research, Researcher

  • 2008.04.01 - 2012.03.31, The Institute of Scientific and Industrial Research, Specially Appointed Researcher

  • 2012.04.01 - 2012.05.31, The Institute of Scientific and Industrial Research, Associate Professor

  • 2012.06.01 - 2013.03.31, The Institute of Scientific and Industrial Research, Associate Professor

  • 2014.06.16 - 2016.03.31, Division of Sustainable Energy and Environmental Engineering, Graduate School of Engineering, Specially Appointed Researcher

  • 2016.04.01 - 2019.03.31, Graduate School of Engineering, Associate Professor

  • 2019.04.01 - , Graduate School of Engineering, Specially Appointed Professor

Education 【 display / non-display

Tokai University Graduate School, Division of Engineering  Completed 1998.03

Employment Record 【 display / non-display

Japan Atomic Energy Agency 1998.04 - 2001.03

Academic Society Membership 【 display / non-display

  • The Society of Polymer Science, Japan

 

Academic Papers 【 display / non-display

  • Fabrication of Thermo-responsive Cell Culture Membrane with Poly(N-isopropylacrylamide) by Electron Beam Graft Polymerization, Ryoya Shimura, Hiroki Yamamoto, Syohei Mikami, Akihiro Oshima, Masakazu Washio, RADIOISOTOPES,68, No.5, 339-344, 2019.05, Papers(In Japanese)

  • High Energy Heavy Ion Beam Irradiation Effects on Polymers and Their Application -Fabrication of Functional Polymer Membranes-, Masakazu Washio, Akihiro Oshima, Naotsugu Nagasawa, Takeshi Murakami, RADIOISOTOPES,68, No.4, 259–265, 2019.04, Papers(In Japanese)

  • Fabrication of thermo-responsive PNIPAAm-g-ETFE for cell culture dishes by pre-irradiation grafting, Yamahara Yumi, Nagasawa Naotsugu, Taguchi Mitsumasa, Oshima Akihiro, Washio Masakazu, RADIATION PHYSICS AND CHEMISTRY,142 88-93, 2018.01, Papers

  • Ecofriendly ethanol-developable processes for electron beam lithography using positive-tone dextrin resist material, Takei Satoshi, Sugino Naoto, Hanabata Makoto, Oshima Akihiro, Kashiwakura Miki, Kozawa Takahiro, Tagawa Seiichi, APPLIED PHYSICS EXPRESS,10(7), 2017.07, Papers

  • Photosensitized Chemically Amplified Resist (TM) (PSCAR (TM)) 2.0 for high throughput and high resolution EUV lithography: Dual photosensitization of acid generation and quencher decomposition by flood exposure, Nagahara Seiji, Carcasi Michael, Shiraishi Gosuke, Nakagawa Hisashi, Dei Satoshi, Shiozawa Takahiro, Nafus Kathleen, De Simone Danilo, Vandenberghe Geert, Stock Hans-Jurgen, Kuchler Bernd, Hori Masafumi, Naruoka Takehiko, Nagai Tomoki, Minekawa Yukie, Iseki Tomohiro, Kondo Yoshihiro, Yoshihara Kosuke, Kamei Yuya, Tomono Masaru, Shimada Ryo, Biesemans Serge, Nakashima Hideo, Foubert Philippe, Buitrago Elizabeth, Vockenhuber Michaela, Ekinci Yasin, Oshima Akihiro, Tagawa Seiichi, ADVANCES IN PATTERNING MATERIALS AND PROCESSES XXXIV,10146, 2017.04, Papers

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