School personnel information

写真b

OHMI Hiromasa


Keyword

thin film engineering, material science, plasma science

URL

http://www-ms.prec.eng.osaka-u.ac.jp/

Gender

Male

Organization 【 display / non-display

  • 2001.09.01 - 2007.03.31, Division of Precision Science & Technology and Applied Physics, Graduate School of Engineering, Research Assistant

  • 2007.04.01 - 2011.03.31, Division of Precision Science & Technology and Applied Physics, Graduate School of Engineering, Assistant Professor

  • 2011.04.01 - , Research Center for Ultra-Precision Science and Technology, Graduate School of Engineering, Assistant Professor

Education 【 display / non-display

Osaka University Faculty of Engineering  Graduated 1995.03
Osaka University Graduate School, Division of Engineering  1997.03
Osaka University Graduate School, Division of Engineering  2001.03

Research topics 【 display / non-display

  • sterilization method by atmospheric pressure mist plasma
    Fundamental plasma-related, Thin film/surface and interfacial physical properties-related

  • atmospheric pressure plasma enhanced chemical transport
    Fundamental plasma-related, Thin film/surface and interfacial physical properties-related

 

Academic Papers 【 display / non-display

  • atmospheric pressure plasma sterilization with water micro-mist, Yoshiki Ogiyama, Hiromasa Ohmi, Keiji Iwamoto, Hiroaki Kakiuchi, and Kiyoshi Yasutake, Proceedings of 6th international symposium on dry process,175, 2006.11, International Conference(Proceedings)

  • Significant Improvement of Copper Dry Etching Property of a High-Pressure Hydrogen-Based Plasma by Nitrogen Gas Addition, Ohmi Hiromasa, Sato Jumpei, Shirasu Yoshiki, Hirano Tatsuya, Kakiuchi Hiroaki, Yasutake Kiyoshi, ACS OMEGA,4(2) 4360-4366, 2019.02, Other

  • Study of the interaction between molten indium and sub-atmospheric pressure hydrogen glow discharge for low-temperature nanostructured metallic particle film deposition, H. Ohmi, H. Kakiuchi and K. Yasutake, Journal of Alloys and Compounds,,728 1217-1225, 2017.09, Papers

  • Determination of plasma impedance of microwave plasma system by electric field simulation, Mitsutoshi Shuto, Hiromasa Ohmi, Hiroaki Kakiuchi, Takahiro Yamada, and Kiyoshi Yasutake, Journal of Applied Physics,122(4) 043303-1-043303-8, 2017.07, Papers

  • Atmospheric-Pressure Low-Temperature Plasma Processes, H. Kakiuchi, H. Ohmi, K. Yasutake, Encyclopedia of Plasma Technology,November 16, 2016 , 2016.11, Review Papers

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Books 【 display / non-display

  • Other, Monthly DISPLAY, 2013.11

  • Special, Low-temperature and high-rate film growth technology using atmospheric-pressure plasma, Hiroaki Kakiuchi, Hiromasa Ohmi, Kiyoshi Yasutake, 2010.12

  • Special, New Coating Technologies, H. Kakiuchi, H. Ohmi, and K. Yasutake, CTI, 2009.10

  • Special, The Latest element Technology of Film Based Electronic, H. Kakiuchi, H. Ohmi, and K. Yasutake, CMC, 2008.10

  • Special, Materials Science Research Trends, H. Kakiuchi, H. Ohmi, and K. Yasutake, Nova Science Publishers, New York, 2008.10

Patents / Utility models / Designs 【 display / non-display

  • Japan, deposition method and deposition apparatus, Ohmi Hiromasa, 2013-215103(Application), 2013.10

  • Japan, purification method and its equipment for Si and manufacturing equipment for purified Si, hiromasa Ohmi, Kiyoshi Yasutake,et al., 4660715(Registration), 2008.06, 2011.01

  • Japan, manufacturing method for selective growth of thin film, Hiromasa Ohmi, Kiyoshi Yasutake, Hiroaki Kakiuchi, 特願 2007-225020(Application), 2007.08

  • Japan, Deposition method and apparatus for functional films by using the atmospheric pressure hydrogen plasma, H.Ohmi, 特願2005-311934(Application), 2005.10

  • Japan, mono silane generator , Hiromasa Ohmi, 2014-052668(Application), 2014.03

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