School personnel information

写真b

SETSUHARA Yuichi


Keyword

surface & interface control, nonequillibrium material process, plasma science and technology, plasma electronics

Organization 【 display / non-display

  • 1996.06.01 - 2001.05.31, Joining and Welding Research Institute, Research Assistant

  • 2004.07.01 - , Joining and Welding Research Institute, Professor

Education 【 display / non-display

Osaka University Faculty of Engineering  Graduated 1986.03
Osaka University Graduate School, Division of Engineering  Completed 1988.03
Osaka University Graduate School, Division of Engineering  Completed Dr. Eng. 1991.03

Employment Record 【 display / non-display

Joining and Welding Research Institute, Osaka University, Professor 2004.07 -

Research topics 【 display / non-display

  • My research activities encompass works on development of process control technologies of surface and interface for advancement of materials joining science and processing technologies through creation of novel process-energy sources (plasmas and particle beams), and span the range of applications from to functionalization of materials to their process control. These research activities are based on fundamental studies on energy transfer dynamics involved in a variety of materials processing with process-energy sources.
    Specific areas of research include development and control of meters-scale large-area plasma sources; low-temperature and low-damage processing of functional materials; and studies on temporal and spatial control of discharge for development of innovative plasma sources for plasma medicine.
    Applied condensed matter physics-related, Fundamental plasma-related, Thin film/surface and interfacial physical properties-related

 

Academic Papers 【 display / non-display

  • High rate formation of silicon nitride thin films using plasma-assisted reactive sputtering deposition, Kosuke Takenaka, Yuichi Setsuhara, Jeon Geon Han, Giichiro Uchida and Akinori Ebe, Thin Solid Films,685, (2019) 306-311., 2019.09, Papers

  • Droplet-Vaporization Behavior during Plasma-Assisted Mist Chemical Vapor Deposition of Zinc Oxide Films, Kosuke Takenaka and Yuichi Setsuhara, Plasma Sources Science & Technology,28, (2019) 065015/1-065015/8., 2019.06, Papers

  • Low-temperature formation of high-mobility a-InGaZnOx films using plasma-enhanced reactive processes, Kosuke Takenaka, Masashi Endo, Hiroyuki Hirayama, Giichiro Uchida Akinori Ebe and Yuichi Setsuhara, Japanese Journal of Applied Physics,58, (2019) 090605/1-090605/5., 2019.06, Papers

  • Decomposition and oxidation of methionine and tryptophan following irradiation with a nonequilibrium plasma jet and applications forkilling cancer cells, Giichiro Uchida, Yusuke Mino, Tensho Suzuki, Jun-ichiro Ikeda, Takashi Suzuki, Kosuke Takenaka and Yuichi Setsuhara, Scientific Reports,9, (2019) 6625/1-6625/17., 2019.04, Papers

  • Effects of post-deposition plasma treatments on stability of amorphous InGaZnOx thin-film transistors prepared with plasma-assisted reactive magnetron sputtering, K. Takenaka, M. Endo, G. Uchida and Y. Setsuhara, Japanese Journal of Applied Physics,58, 2s (2019) SAAC03/1-SAAC03/5., 2019.02, Papers

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Books 【 display / non-display

  • Special, Novel Structured Metallic and Inorganic Materials, Yuichi Setsuhara, Toshio Kamiya, Shin-ichi Yamaura, Springer, ISBN, 978-981-13-7610-8, 2019.07

  • Textbook, Plasma Medical Science, Yuichi Setsuhara, Giichiro Uchida, Kosuke Takenaka, Elsevier, ISBN, 9780128150047, 2018.07

  • Special, Comprehensive Materials Processing, Yuichi Setsuhara, Elsevier, ISBN, 978-0080965321, 2014.06

  • Special, Progress in Advanced Structural and Functional Materials Design, Yuichi Setsuhara, Springer, ISBN, 978-4-431-54063-2, 2013.01

  • Special, Nanoparticle Technology Handbook (Second Edition), Yuichi Setsuhara, ISBN, 978-0-4445-6336-1, 2012.05

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Patents / Utility models / Designs 【 display / non-display

  • United States, Plasma generator, S. Miyake, T. Shoji, Y. Setsuhara, United States Patent 7,098,599(Registration), 2006.08

Awards 【 display / non-display

  • ICMaSS2019/ iLIM-s Outstanding Presentation Award, Hiroyuki Hirayama, Kosuke Takenaka, Yuichi Setsuhara, ICMaSS2019, 2019.11

  • Best presentation award, Giichiro Uchida, Taiki Ito, Kosuke Takenaka, Junichiro Ikeda and Yuichi Setsuhara, ISPlasma2017/IC-PLANTS2017, 2017.03

  • Participants' Poster Prize, G. Uchida, A. Nakajima, T. Ito, K. Takenaka, T. Kawasaki, K. Koga, M. Shiratani, Y. Setsuhara, 6th International Conference on Plasma Medicine, 2016.09

  • Invited Presentation Award, Interfinish 2008 World Interfinish Congress & Exposition, Yuichi Setsuhara, The Korean Institute of Surface Engineering, 2008.06