School personnel information

写真b

KAKIUCHI Hiroaki


Keyword

Thin film engineering, atmospheric-pressure plasma process

URL

http://www.prec.eng.osaka-u.ac.jp

Organization 【 display / non-display

  • 2001.08.01 - 2007.03.31, Division of Precision Science & Technology and Applied Physics, Graduate School of Engineering, Associate Professor

  • 2007.04.01 - , Division of Precision Science & Technology and Applied Physics, Graduate School of Engineering, Associate Professor

Education 【 display / non-display

Osaka University Faculty of Engineering  Graduated 1989.03
Osaka University Graduate School, Division of Engineering  Completed 1991.03

Academic Society Membership 【 display / non-display

  • The Japan Society of Applied Physics

 

Academic Papers 【 display / non-display

  • Atmospheric-Pressure Low-Temperature Plasma Processes, H. Kakiuchi, H. Ohmi, K. Yasutake, Encyclopedia of Plasma Technology,November 16, 2016 , 2016.11, Review Papers

  • Characterization of Si and SiOx films deposited in very high-frequency excited atmospheric-pressure plasma and their application to bottom-gate thin film transistors, H. Kakiuchi, H. Ohmi, T. Yamada, S. Tamaki, T. Sakaguchi, W. Lin, K. Yasutake, Phys. Status Solidi A,DOI 10.1002/pssa.201532328, 2015.05, Papers

  • Atmospheric-pressure low-temperature plasma processes for thin film deposition, H. Kakiuchi, H. Ohmi, and K. Yasutake, J. Vac. Sci. Technol. A,Vol. 32, No. 3, 030801-1-16, 2014.05, Papers

  • Silicon Oxide Coatings with Very High Rates (>10 nm/s) by Hexamethildisiloxane-Oxygen Fed Atmospheric-Pressure VHF Plasma: Film-Forming Behavior Using Cylindrical Rotary Electrode, H. Kakiuchi, H. Ohmi, T. Yamada, K. Yokoyama, K. Okamura, and K. Yasutake, Plasma Chem. Plasma Process.,32, pp. 533–545, 2012.07, Papers

  • High-Rate HMDSO-Based Coatings in Open Air Using Atmospheric-Pressure Plasma Jet, H. Kakiuchi, K. Higashida, T. Shibata, H. Ohmi, T. Yamada, and K. Yasutake, Journal of Non-Crystalline Solids,358, 2462-2465, 2012.01, Papers

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Books 【 display / non-display

  • Other, Monthly DISPLAY, 2013.11

  • Special, Low-temperature and high-rate film growth technology using atmospheric-pressure plasma, Hiroaki Kakiuchi, Hiromasa Ohmi, Kiyoshi Yasutake, 2010.12

  • Special, Materials Science Research Trends, H. Kakiuchi, H. Ohmi, and K. Yasutake, Nova Science Publishers, New York, 2008.10

  • Textbook, Atmospheric-pressure plasma technologies and their applications for thin film deposition, Hiroaki Kakiuchi, 2014.11

  • Textbook, Low-temperature and high-rate film growth technology using atmospheric-pressure plasma CVD, Hiroaki Kakiuchi, 2010.10

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Patents / Utility models / Designs 【 display / non-display

  • Japan, Crystalline SiC Formation Method by Carbonization of Si Surface and Crystalline SiC Substrates, H. Kakiuchi, H. Ohmi, K. Yasutake, 特願2005-329318(Registration), 2005.11

  • Japan, manufacturing method for selective growth of thin film, Hiromasa Ohmi, Kiyoshi Yasutake, Hiroaki Kakiuchi, 特願 2007-225020(Application), 2007.08

 

Conference management 【 display / non-display

  • International Conference, Fifth International Symposium on Atomically Controlled Fabrication Technology, Program Committee Member, 2012.10

  • International Conference, Fourth International Symposium on Atomically Controlled Fabrication Technology, Program Committee Member, 2011.10

  • International Conference, Third International Symposium on Atomically Controlled Fabrication Technology, Program Committee Member, 2010.11

  • International Conference, Second International Symposium on Atomically Controlled Fabrication Technology, Program Committee Member, 2009.11

  • International Conference, First International Symposium on Atomically Controlled Fabrication Technology --- Surface and Thin Film Processing ---, Program Committee Member, 2009.02

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