School personnel information

写真b

KATOU Yuushi


Keyword

Plasma Science, Beam Application, Multicharged Ion Source, ECR Plasma

URL

http://fusion.eie.eng.osaka-u.ac.jp/

Organization 【 display / non-display

  • 2005.04.01 - 2007.03.31, Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Associate Professor

  • 2007.04.01 - , Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Associate Professor

Education 【 display / non-display

Osaka University Graduate School, Division of Engineering  Completed 1990.03

Research topics 【 display / non-display

  • Advanced Beam System and Their Novel Applications.
    ECR Plasma/Ion Soueces and Applications.
    Production and Application of ECR Plasma for Processing.

 

Academic Papers 【 display / non-display

  • Optimization of microwave injection at compact ECR ion source, Masayuki Muramatsu, Atsushi Kitagawa, Ken Katagiri, Satoru Hojo, Taku Suzuki, Kouta Hamada, Katsuyuki. Takahashi, Yushi Kato, and Fumihisa Ouchi, 2018 22nd International Conference on Ion Implantation Technology (IIT), IEEE Xplore Digital Library, IEEE Conference Publications,IEEE Catalog Number CFP1844Y-ART, ISBN: 978-1-5386-6829-0, 2018, pp.200-202, 2019.08, Papers

  • Constructing Ion Beam Irradiation System on ECRIS for Estimating Damage of Satellites Components by Low Energy Xe Ion Beams, Tatsuto Takeda, Takuro Otsuka, Shogo Hagino, Koji Onishi, Kouta Hamada, Takayuki Omori, Kazuki Okumura, and Yushi Kato, 2018 22nd International Conference on Ion Implantation Technology (IIT), IEEE Xplore Digital Library, IEEE Conference Publications,IEEE Catalog Number CFP1844Y-ART, ISBN: 978-1-5386-6829-0, 2018, pp.203-206, 2019.08, Papers

  • Optimum Conditions on Support Gases for Producing Fullerene Ions and Purifying on ECRIS, Koji Onishi, Kouta Hamada, Tatsuto Takeda, Takayuki Omori, Kazuki Okumura, and Yushi Kato, Takashi Uchida, Masayuki Muramatsu, Atsushi Kitagawa, and Yoshikazu Yoshida, 2018 22nd International Conference on Ion Implantation Technology (IIT), IEEE Xplore Digital Library, IEEE Conference Publications,IEEE Catalog Number CFP1844Y-ART, ISBN: 978-1-5386-6829-0, 2018, pp.207-210, 2019.08, Papers

  • Enhancement of Beam Intensity in Electron Cyclotron Resonance Plasma by DC Biased Plate-Tuner, Kouta Hamada, Koji Onishi, Tatsuto Takeda, Takayuki Omori, Kazuki Okumura, and Yushi Kato, 2018 22nd International Conference on Ion Implantation Technology (IIT), IEEE Xplore Digital Library, IEEE Conference Publications,IEEE Catalog Number CFP1844Y-ART, ISBN: 978-1-5386-6829-0, 2018, pp.219 – 222, 2019.08, Papers

  • Experimental Condition and Optimization for Coexistence of Fullerene and Iron Ions on ECRIS, Yushi Kato, Yuto Tsuda, Takuto Watanabe, Koji Onishi, Kouta Hamada, Tatsuto Takeda, Takayuki Omori, Kazuki Okumura, Tadashi Uchida, Masayuki Muramatsu, Atsushi Kitagawa, and Yoshikazu Yoshida, 2018 22nd International Conference on Ion Implantation Technology (IIT2018), IEEE Xplore Digital Library, IEEE Conference Publications,IEEE Catalog Number CFP1844Y-ART, ISBN:978-1-5386-6829-0, 2018, pp.172-175, 2019.08, Papers

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