School personnel information

写真b

Itani Toshiro


Keyword

Nano-Lithography

Organization 【 display / non-display

  • 2018.10.01 - , The Institute of Scientific and Industrial Research, Specially Appointed Professor

Education 【 display / non-display

Osaka University Graduate School, Division of Engineering Science  Completed Doctor (Engineering) 1998.03
 

Academic Papers 【 display / non-display

  • Extremely large depth-of-focus lithography system using KrF excimer laser, Julius Joseph Santillan, Nobutaka Uemori, Hiroshi Yamaoka, Toshiro Itani,32nd International Microprocesses and Nanotechnology Conference, 2019.10, Conference Report / Oral Presentation

  • Alternative developer solutions and processes for EUV lithography, Julius Joseph Santillan, Masahiko Harumoto, Chisayo Nakayama, Yuji Tanaka, Tomohiro Motono, Masaya Asai, Toshiro Itani,SPIE Photomask Technology + Extreme Ultraviolet Lithography, 2019.09, Conference Report / Oral Presentation

  • Resist patterning characteristics using KrF laser-ablation process, Hiroshi Yamaoka, Julius Joseph Santillan, Nobutaka Uemori, and Toshiro Itani, J. Photopolym. Sci. Technol.,32(2) 355-360, 2019.05, Papers

  • Alternative developer solutions and processes for EUV and ArFi lithography, Masahiko Harumoto, Julius Joseph Santillan, Chisayo Nakayama, Yuji Tanaka, Tomohiro Motono, Masaya Asai, Toshiro Itani, J. Photopolym. Sci. Technol.,32(2) 321-326, 2019.05, Papers

  • Pulse radiolysis of methacrylic acid ligand for zirconia nanoparticle resist, Teppei Yamada, Satoshi Ishihara, Yusa Muroya, Julius Joseph Santillan, Shinichi Yamashita, Toshiro Itani, Takahiro Kozawa, Jpn. J. Appl. Phys.,58(3) 036503, 2019.02, Papers

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