School personnel information

写真b

SANTILLAN JULIUS JOSEPH SUDLAY


Keyword

Nano-Lithography

Organization 【 display / non-display

  • 2018.10.01 - , The Institute of Scientific and Industrial Research, Associate Professor

Education 【 display / non-display

University of Tsukuba Graduate School of Pure and Applied Sciences Nano-Science and Nano-Technology Completed Doctor (Engineering) 2014.03
 

Academic Papers 【 display / non-display

  • Extremely large depth-of-focus lithography system using KrF excimer laser, Julius Joseph Santillan, Nobutaka Uemori, Hiroshi Yamaoka, Toshiro Itani,32nd International Microprocesses and Nanotechnology Conference, 2019.10, Conference Report / Oral Presentation

  • Alternative developer solutions and processes for EUV lithography, Julius Joseph Santillan, Masahiko Harumoto, Chisayo Nakayama, Yuji Tanaka, Tomohiro Motono, Masaya Asai, Toshiro Itani,SPIE Photomask Technology + Extreme Ultraviolet Lithography, 2019.09, Conference Report / Oral Presentation

  • Resist patterning characteristics using KrF laser-ablation process, Hiroshi Yamaoka, Julius Joseph Santillan, Nobutaka Uemori, and Toshiro Itani, J. Photopolym. Sci. Technol.,32(2) 355-360, 2019.05, Papers

  • Alternative developer solutions and processes for EUV and ArFi lithography, Masahiko Harumoto, Julius Joseph Santillan, Chisayo Nakayama, Yuji Tanaka, Tomohiro Motono, Masaya Asai, Toshiro Itani, J. Photopolym. Sci. Technol.,32(2) 321-326, 2019.05, Papers

  • Analysis of line-and-space patterns of ZrO2 nanoparticle resist on the basis of EUV sensitization mechanism , Takahiro Kozawa, Teppei Yamada, Yusa Muroya, Julius J. Santillan, Toshiro Itani, Proc. SPIE,Extreme Ultraviolet (EUV) Lithography X(10957) 109570C, 2019.02, International Conference(Proceedings)

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